| Customization: | Available |
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| Warranty: | 1 Year |
| Type: | Magnetron Sputtering Coating Instrument |
| Shipping Cost: | Contact the supplier about freight and estimated delivery time. |
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Three target magnetron sputtering coating instrument is a special laboratory coating instrument developed by our company, the equipment can be selected with DC power supply, and RF power supply, power ranging from 500W-1000W. Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and fast speed, high coating rate and low sample temperature rise, which is a typical of high-speed and low-temperature sputtering.
| Model | KS -MSC-300S |
Sample load table parameters
|
Size | φ150mm |
| Supply voltage | AC220V,50Hz | Heating temperature | Max 500ºC | |
| Machine power | 6kW | Temperature control accuracy | ±1ºC | |
| Final vacuum | 5*10-4Pa | Speed | And 1-20rpm is adjustable | |
| Gas flow rate controller | 1-way 200sccm Ar | Magtron sputtering head parameters |
Quantity | 3*2 " magnetron sputtering heads |
| Vacuum pump |
Equipped with a molecular pump system, pumping speed of 600L/S |
Cooling-down method | Water cooling, with the required flow rate of 10 L/min | |
| Water cooler specifications | 10 L/min circulating water cooler | |||
| Film thickness gauge |
A quartz vibration film thickness meter with a resolution of 0.10A |
Vacuum Chamber |
Chamber size | φ300mm*340mm |
| Chamber material | Stainless steel | |||
|
Splash power supply
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DC power supply, 500W-1000W, suitable for the preparation of metal film; RF power supply, 500W-1000W, suitable for non-metal coating |
watch window | φ100mm | |
| Open way | Top top type, easy to replace the target material | |||
| Machine size | 1090mm*900mm*1250mm | |||
| The weight of the machine | 350kg | |||